专利名称：COMBINED ELECTROCHEMICAL AND
CHEMICAL ETCHING PROCESSES FORGENERATION OF POROUS SILICONPARTICULATES
发明人：Sibani Lisa Biswal,Michael S. Wong,Madhuri
Thakur,Steven L. Sinsabaugh
申请号：US14149055申请日：20140107
公开号：US20140193711A1公开日：20140710
专利附图：
摘要：Embodiments of the present disclosure pertain to methods of preparingporous silicon particulates by: (a) electrochemically etching a silicon substrate, whereelectrochemical etching comprises exposure of the silicon substrate to an electric currentdensity, and where electrochemical etching produces a porous silicon film over the siliconsubstrate; (b) separating the porous silicon film from the silicon substrate, where theseparating comprises a gradual increase of the electric current density in sequentialincrements; (c) repeating steps (a) and (b) a plurality of times; (d) electrochemicallyetching the silicon substrate in accordance with step (a) to produce a porous silicon filmover the silicon substrate; (e) chemically etching the porous silicon film and the siliconsubstrate; and (f) splitting the porous silicon film and the silicon substrate to formporous silicon particulates. Further embodiments of the present disclosure pertain to theformed porous silicon particulates and anode materials that contain them.
申请人：Sibani Lisa Biswal,Michael S. Wong,Madhuri Thakur,Steven L. Sinsabaugh
地址：Houston TX US,Houston TX US,Houston TX US,Uniontown OH US
国籍：US,US,US,US
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